Applications
wet oxidation of semiconductor devices in the fields of photonics
(VCSEL, laser diodes, waveguides) and microelectronics (MOSFET)
Features
ALOX type Wet Oxidation Furnace
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Controlled accurate flowing of moisturized gas for a selective oxidation process
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Uniformly stabilized temperature (between 350°C and 600°C)
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Embedded In-Situ IR optical monitoring system
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Stabilized pressure reang(100~800mbar)
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Automated / interface controlled process for a better reproducibility
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Wafer size: 2"~6"