1. Wet cleaning/etching Bench :Parts cleaning, wafer cleaning (cassette type),wet etching of chip process (cassette type)

2. Central Chemical Distribution System (CDS): Supply / recovery of acid, alkali, organic solutions

          3. Wafer Dryer: remove moisture from the wafer surface

1. Wet cleaning/etching Bench:

Ø   Can be Customized

Ø   low maintenance costs.

Ø   Fully automatic Wet Bench is cassette type, up to 12”:

• Auto Robot transmission for linear slot-to-slot transmission and straight lines
• Load/Unload system have functions of single batch and continuous run
• For process of being immersed for a long time, can be equipped with a shaking mechanism module
• Can be equipped with wafer dryer to meet the requirement of Dry/Wet-in and Dry-out
• A customizable Scheduler travel control system for production lines with many process steps and complex procedures.

2. Central Chemical Distribution System(CDS):

Ø   Using advanced materials and multiple integrated and non-splicing designs to mostly reduce the possibility of liquid leakage as well as low maintenance cost

Ø   Can be Customized

 3. Wafer Dryer:

• Spin type: Use centrifugal force to remove moisture from the wafer surface
• Maragoni IPA type: Use surface tension to remove moisture from the wafer surface, and the tank body is integrally formed.
• IPA vapor type:
  • using IPA to remove moisture from the wafer surface. 
  • For the requirement of environmental and water saving.
  • IPA heaters are exclusively designed and patented.

1. Wet chemical cleaning (etching) bench: depends on customer requirement.

2. Central Chemical Distribution System(CDS): depends on customer requirement.

       3. Wafer Dryer: depends on customer requirement.