Dry EPD, Wet EPD, Plasma Monitor

1. Monitoring and optimization of vacuum plasma film process by define the Just Etching Point

2. Vacuum plasma anomaly detection

3. Monitoring and optimization of the wet (metal layer) etching process of the panel by define the Just Etching Point

	product
	Dry EPD	Wet EPD	Plasma Monitor
feature	1. Wavelength: 200~850nm 2. Min. Accuracy:<±0.7nm 3. Resolution:<1.5nm@25um slit 4. High sensitivity with CCD 2,048pixels 5. Capbility of open ratio~2%	1. Composed of light source, sensor and collimating lens module 2. Use an algorithm reducing noise by the spray of liquid etchant or its drop 3. Advanced EPD algorithms : Threshold method, Window method	1. Data gathering resolution : 1us 2. Use an algorithm reducing noise by the spray of liquid etchant or its drop 3. Advanced algorithms : Noise reduction, Image processing
application	Dry Echer(ICP, RIE..), Asher	wet bench of LCD proces	Diffusion, Etcher, PECVD

EPD, OES, plasma monitor, SPOES, WET EPD,

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